View source for 20240012326. PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN simplified abstract (ASAHI KASEI KABUSHIKI KAISHA)

=PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN=


==Organization Name==

[[:Category:ASAHI KASEI KABUSHIKI KAISHA|ASAHI KASEI KABUSHIKI KAISHA]]


[[Category:ASAHI KASEI KABUSHIKI KAISHA]]

==Inventor(s)==

[[:Category:Shota Yanagi of Tokyo (JP)|Shota Yanagi of Tokyo (JP)]][[Category:Shota Yanagi of Tokyo (JP)]]

==PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240012326 titled 'PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN

==Simplified Explanation==

The abstract describes a photosensitive element consisting of a support film and a photosensitive resin composition layer. The developed interfacial ratios of the support film on both sides satisfy a specific formula.

* The photosensitive element consists of a support film and a photosensitive resin composition layer.
* The developed interfacial ratios of the support film on both sides must satisfy a specific formula.
* The formula is defined as sdr/sdr < 0.75, where sdr represents the developed interfacial ratio.
* The abstract mentions the ISO 25178 standard as a reference for defining the interfacial ratios.
* The abstract does not provide further details about the specific composition or application of the photosensitive element.

Potential Applications:
* This photosensitive element could be used in various industries that require photosensitive materials, such as photography, printing, or lithography.
* It may find applications in the production of printed circuit boards, where photosensitive elements are used for etching patterns onto the boards.
* The element could be utilized in the manufacturing of microelectromechanical systems (MEMS) or microfluidic devices, where precise patterning is crucial.

Problems Solved:
* The photosensitive element ensures a specific developed interfacial ratio between the support film and the photosensitive resin composition layer.
* This ratio may be important for achieving desired properties or performance in the final product.
* By defining and controlling the interfacial ratios, the element addresses potential issues related to adhesion, uniformity, or compatibility between the layers.

Benefits:
* The photosensitive element provides a controlled and optimized interface between the support film and the photosensitive resin composition layer.
* It allows for improved adhesion and compatibility between the layers, leading to enhanced overall performance.
* The defined interfacial ratios ensure consistent and reliable results in the manufacturing process.
* The element may contribute to the production of high-quality and precise patterns in various applications.


==Original Abstract Submitted==

a photosensitive element including, in this order, a support film (a) and a photosensitive resin composition layer (b), wherein a developed interfacial ratio sdr(%) of an interface of the support film (a) on a side in contact with the photosensitive resin composition layer (b) and a developed interfacial ratio sdr(%) of an interface thereof on the opposite side as defined in iso 25178 satisfy the following formula (1): sdr/sdr<0.75 (1)



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