View source for 18151416. EUV MASKS TO PREVENT CARBON CONTAMINATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

=EUV MASKS TO PREVENT CARBON CONTAMINATION=


==Organization Name==

[[:Category:Taiwan Semiconductor Manufacturing Co., Ltd.|Taiwan Semiconductor Manufacturing Co., Ltd.]]


[[Category:Taiwan Semiconductor Manufacturing Co., Ltd.]]

==Inventor(s)==

[[:Category:Pei-Cheng Hsu of Taipei City (TW)|Pei-Cheng Hsu of Taipei City (TW)]][[Category:Pei-Cheng Hsu of Taipei City (TW)]]

[[:Category:Ta-Cheng Lien of Hsinchu County (TW)|Ta-Cheng Lien of Hsinchu County (TW)]][[Category:Ta-Cheng Lien of Hsinchu County (TW)]]

[[:Category:Hsin-Chang Lee of Hsinchu County (TW)|Hsin-Chang Lee of Hsinchu County (TW)]][[Category:Hsin-Chang Lee of Hsinchu County (TW)]]

==EUV MASKS TO PREVENT CARBON CONTAMINATION - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18151416 titled 'EUV MASKS TO PREVENT CARBON CONTAMINATION

==Simplified Explanation==

The patent application describes a method for forming a multi-layered reflective layer over a substrate, followed by the deposition of various metal and metal oxide layers. Features are then formed on the top layers.

* The method involves the formation of a multi-layered reflective layer over a substrate.
* A metal capping layer is deposited over the reflective layer.
* A first metal oxide layer is deposited over the metal capping layer.
* A metal nitride layer is deposited over the first metal oxide layer.
* A second metal oxide layer is deposited over the metal nitride layer.
* Features are formed on the second metal oxide layer and the metal nitride layer.

== Potential Applications ==
* Optical coatings
* Photovoltaic devices
* Display technologies
* Semiconductor manufacturing

== Problems Solved ==
* Improved reflective properties
* Enhanced durability and resistance to degradation
* Increased efficiency of optical devices
* Better performance of semiconductor devices

== Benefits ==
* Higher reflectivity
* Improved optical performance
* Increased device efficiency
* Enhanced durability and longevity


==Original Abstract Submitted==

A method includes forming a multi-layered reflective layer over a substrate; depositing a metal capping layer over the multi-layered reflective layer; depositing a first metal oxide layer over the metal capping layer; depositing a metal nitride layer over the first metal oxide layer; depositing a second metal oxide layer over the metal nitride layer; forming a plurality of features on the second metal oxide layer and the metal nitride layer.



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