View source for 18100409. METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

=METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL=


==Organization Name==

[[:Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.|TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]


[[Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]

==Inventor(s)==

[[:Category:Chi-Hung Liao of Hsinchu (TW)|Chi-Hung Liao of Hsinchu (TW)]][[Category:Chi-Hung Liao of Hsinchu (TW)]]

[[:Category:Po-Ming Shih of Sanchong City (TW)|Po-Ming Shih of Sanchong City (TW)]][[Category:Po-Ming Shih of Sanchong City (TW)]]

==METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18100409 titled 'METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL

==Simplified Explanation==

The patent application describes an apparatus designed to reduce hydrogen permeation of a mask used in generating extreme ultraviolet (EUV) radiation. The apparatus includes a mask stage, a hydrogen dispensing nozzle, and a trajectory correcting assembly.

* The mask stage holds the mask during the generation of EUV radiation.
* The hydrogen dispensing nozzle ejects hydrogen below the mask.
* The trajectory correcting assembly consists of a correcting nozzle and a gas flow detector.
* The correcting nozzle dispenses a flow adjusting gas to redirect the trajectory of the hydrogen away from the mask's edge, reducing hydrogen permeation.
* The gas flow detector measures the airflow variation of the hydrogen after it has been adjusted by the flow adjusting gas.

== Potential Applications ==
* This technology can be applied in the field of extreme ultraviolet (EUV) lithography, which is used in semiconductor manufacturing.
* It can also be used in other applications where reducing hydrogen permeation of a mask is important, such as in the production of microelectromechanical systems (MEMS) or nanotechnology.

== Problems Solved ==
* Hydrogen permeation of a mask can lead to degradation and reduced performance of the mask, affecting the quality of the generated extreme ultraviolet (EUV) radiation.
* The apparatus solves the problem of hydrogen permeation by adjusting the trajectory of the hydrogen away from the mask's edge, reducing its permeation and potential damage.

== Benefits ==
* By reducing hydrogen permeation, the apparatus helps maintain the integrity and performance of the mask used in generating extreme ultraviolet (EUV) radiation.
* Improved mask performance leads to better quality EUV radiation, which is crucial in semiconductor manufacturing and other applications.
* The gas flow detector allows for precise measurement and control of the adjusted hydrogen airflow, ensuring optimal performance of the apparatus.


==Original Abstract Submitted==

An apparatus for reducing hydrogen permeation of a mask is provided when generating extreme ultraviolet (EUV) radiation. The apparatus includes a mask stage configured to hold the mask, a hydrogen dispensing nozzle configured to eject hydrogen below the mask, and a trajectory correcting assembly. The trajectory correcting assembly includes a correcting nozzle and a gas flow detector. The correcting nozzle is configured to dispense at least one flow adjusting gas to adjust a trajectory of the hydrogen away from the mask to reduce hydrogen permeation at an edge of the mask. The gas flow detector is configured to measure a variation of an airflow of the hydrogen adjusted by the at least one flow adjusting gas.



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