View source for 18095125. SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

=SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME=


==Organization Name==

[[:Category:Samsung Electronics Co., Ltd.|Samsung Electronics Co., Ltd.]]


[[Category:Samsung Electronics Co., Ltd.]]

==Inventor(s)==

[[:Category:SANGJINE Park of Suwon-si (KR)|SANGJINE Park of Suwon-si (KR)]][[Category:SANGJINE Park of Suwon-si (KR)]]

[[:Category:Ji Hwan Park of Suwon-si (KR)|Ji Hwan Park of Suwon-si (KR)]][[Category:Ji Hwan Park of Suwon-si (KR)]]

[[:Category:KUNTACK Lee of Suwon-si (KR)|KUNTACK Lee of Suwon-si (KR)]][[Category:KUNTACK Lee of Suwon-si (KR)]]

==SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18095125 titled 'SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING A SUBSTRATE USING THE SAME

==Simplified Explanation==

The abstract describes a method of processing a substrate by drying it using a combination of gas and supercritical fluid in a drying chamber. 

* The substrate is placed in a drying chamber.
* A gas is supplied into the drying chamber.
* After the gas is supplied, a supercritical fluid is also supplied into the drying chamber.
* The combination of gas and supercritical fluid helps in the drying process of the substrate.

== Potential Applications ==
* Semiconductor manufacturing: This method can be used to dry substrates during the production of semiconductors.
* Pharmaceutical industry: The drying process can be applied to pharmaceutical substrates to remove moisture and improve product stability.
* Food processing: The method can be used to dry food substrates, such as fruits or vegetables, to extend their shelf life.

== Problems Solved ==
* Efficient drying: The combination of gas and supercritical fluid provides an efficient drying process for substrates.
* Moisture removal: The method effectively removes moisture from substrates, preventing damage or degradation.
* Uniform drying: The use of gas and supercritical fluid ensures uniform drying of the substrate, avoiding any unevenness.

== Benefits ==
* Faster drying: The combination of gas and supercritical fluid speeds up the drying process, reducing overall processing time.
* Improved product quality: The efficient drying method helps maintain the quality and integrity of the substrate.
* Versatile application: The method can be applied to various industries and substrates, making it a versatile solution for drying processes.


==Original Abstract Submitted==

A method of processing a substrate includes disposing a substrate in a drying chamber, and supplying a fluid into the drying chamber in which the substrate is disposed. The supplying of the fluid into the drying chamber includes supplying a gas into the drying chamber, and supplying a supercritical fluid into the drying chamber after the supplying of the gas is started.



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