View source for 17967228. ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Yasuhiro Hidaka of Yokohama City (JP)|Yasuhiro Hidaka of Yokohama City (JP)]][[Category:Yasuhiro Hidaka of Yokohama City (JP)]]

==ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17967228 titled 'ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER

==Simplified Explanation==

The abstract describes an ellipsometer that can improve the calculation of ellipsometry coefficients (ψ, Δ) even when using a light source with a wide wavelength band and a spectrometer. It also mentions an apparatus for inspecting a semiconductor device that incorporates this ellipsometer.

* The ellipsometer includes a polarizing optical element unit that separates reflected light into two polarization components with orthogonal polarization directions.
* An analyzer unit transmits components of a different direction to make the two polarization components interfere with each other, forming an interference fringe in the shape of a concentric circle.
* An image detector detects the interference fringe, and processing circuitry calculates the ellipsometry coefficients from the fringe.

==Potential Applications==
* Semiconductor device inspection
* Thin film characterization
* Surface analysis

==Problems Solved==
* Improved calculation of ellipsometry coefficients with a combination of a wide wavelength band light source and a spectrometer
* Enhanced throughput in ellipsometry measurements

==Benefits==
* Accurate measurement of ellipsometry coefficients
* Increased efficiency in ellipsometry measurements
* Versatile application in various industries, such as semiconductor manufacturing and materials research


==Original Abstract Submitted==

An ellipsometer capable of improving a throughput calculating ellipsometry coefficients (ψ, Δ) even when performing measurement with a combination of a light source having a wide wavelength band and a spectrometer, and an apparatus for inspecting a semiconductor device is e hid g the ellipsometer may be provided. The ellipsometer includes a polarizing optical element unit for separating reflected light into two polarization components having polarization directions that are orthogonal to each other in a radial direction with respect to an optical axis of an optical system of the reflected light, an analyzer unit for transmitting components of a direction different from the polarization directions of the two polarization components to make the two polarization components interfere with each other, and to form an interference fringe in a form of a concentric circle, an image detector for detecting the interference fringe, and processing circuitry for calculating ellipsometry coefficients from the interference fringe.



[[Category:G01N21/21]]
[[Category:G02B5/30]]
[[Category:H01L21/67]]