View source for 17742260. RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Ran Namgung of Suwon-si (KR)|Ran Namgung of Suwon-si (KR)]][[Category:Ran Namgung of Suwon-si (KR)]]

[[:Category:Hyeon Park of Suwon-si (KR)|Hyeon Park of Suwon-si (KR)]][[Category:Hyeon Park of Suwon-si (KR)]]

[[:Category:Shinhyo Bae of Suwon-si (KR)|Shinhyo Bae of Suwon-si (KR)]][[Category:Shinhyo Bae of Suwon-si (KR)]]

[[:Category:Daeseok Song of Suwon-si (KR)|Daeseok Song of Suwon-si (KR)]][[Category:Daeseok Song of Suwon-si (KR)]]

[[:Category:Minki Chon of Suwon-si (KR)|Minki Chon of Suwon-si (KR)]][[Category:Minki Chon of Suwon-si (KR)]]

[[:Category:Jun Soo Kim of Hwaseong-si (KR)|Jun Soo Kim of Hwaseong-si (KR)]][[Category:Jun Soo Kim of Hwaseong-si (KR)]]

[[:Category:Hyun-Woo Kim of Seongnam-si (KR)|Hyun-Woo Kim of Seongnam-si (KR)]][[Category:Hyun-Woo Kim of Seongnam-si (KR)]]

[[:Category:Hyun-Ji Song of Anyang-si (KR)|Hyun-Ji Song of Anyang-si (KR)]][[Category:Hyun-Ji Song of Anyang-si (KR)]]

[[:Category:Young Joo Choi of Hwaseong-si (KR)|Young Joo Choi of Hwaseong-si (KR)]][[Category:Young Joo Choi of Hwaseong-si (KR)]]

[[:Category:Suk-Koo Hong of Hwaseong-si (KR)|Suk-Koo Hong of Hwaseong-si (KR)]][[Category:Suk-Koo Hong of Hwaseong-si (KR)]]

==RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17742260 titled 'RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

==Simplified Explanation==

The abstract describes a resist topcoat composition and a method of forming patterns using this composition. The composition includes an acrylic copolymer, an acid compound, and a solvent.

* The resist topcoat composition is used to form patterns.
* The composition includes an acrylic copolymer with specific structural units.
* An acid compound is also included in the composition.
* The composition is dissolved in a solvent.
* The method involves applying the resist topcoat composition to a substrate and then exposing it to a patterned radiation source.
* The resist topcoat composition helps in the formation of patterns on the substrate.

==Potential Applications==
* Semiconductor manufacturing
* Microelectronics fabrication
* Photolithography processes

==Problems Solved==
* Provides a method for forming patterns on substrates.
* Enhances the efficiency and accuracy of pattern formation.
* Enables precise control over the pattern formation process.

==Benefits==
* Improved precision in pattern formation.
* Increased efficiency in manufacturing processes.
* Enables the production of complex patterns on substrates.


==Original Abstract Submitted==

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent



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