Information for "Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract"
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Basic information
| Display title | Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract |
| Default sort key | Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract |
| Page length (in bytes) | 3,959 |
| Page ID | 238034 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
Page protection
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
Edit history
| Page creator | Wikipatents (talk | contribs) |
| Date of page creation | 01:56, 25 November 2024 |
| Latest editor | Wikipatents (talk | contribs) |
| Date of latest edit | 01:56, 25 November 2024 |
| Total number of edits | 1 |
| Recent number of edits (within past 90 days) | 1 |
| Recent number of distinct authors | 1 |
