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Bibliographic details for Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract

Citation styles for Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract

APA style

Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract. (2024, November 25). WikiPatents, . Retrieved 08:37, January 16, 2025 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015.

MLA style

"Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract." WikiPatents, . 25 Nov 2024, 01:56 UTC. 16 Jan 2025, 08:37 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015>.

MHRA style

WikiPatents contributors, 'Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract', WikiPatents, , 25 November 2024, 01:56 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015> [accessed 16 January 2025]

Chicago style

WikiPatents contributors, "Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015 (accessed January 16, 2025).

CBE/CSE style

WikiPatents contributors. Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract [Internet]. WikiPatents, ; 2024 Nov 25, 01:56 UTC [cited 2025 Jan 16]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015.

Bluebook style

Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015 (last visited January 16, 2025).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015",
   note = "[Online; accessed 16-January-2025]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "Taiwan semiconductor manufacturing company, ltd. (20240381793). OXYGEN AFFINITY LAYER TO IMPROVE RRAM CELL PERFORMANCE simplified abstract --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240381793)._OXYGEN_AFFINITY_LAYER_TO_IMPROVE_RRAM_CELL_PERFORMANCE_simplified_abstract&oldid=259015}",
   note = "[Online; accessed 16-January-2025]"
 }


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