Micron technology, inc. (20240268240). PROTECTIVE SEALANT FOR CHALCOGENIDE MATERIAL AND METHODS FOR FORMING THE SAME simplified abstract
Contents
PROTECTIVE SEALANT FOR CHALCOGENIDE MATERIAL AND METHODS FOR FORMING THE SAME
Organization Name
Inventor(s)
Farrell M. Good of Meridian ID (US)
Robert K. Grubbs of Boise ID (US)
Gurpreet S. Lugani of Boise ID (US)
PROTECTIVE SEALANT FOR CHALCOGENIDE MATERIAL AND METHODS FOR FORMING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240268240 titled 'PROTECTIVE SEALANT FOR CHALCOGENIDE MATERIAL AND METHODS FOR FORMING THE SAME
Simplified Explanation: The patent application describes techniques to protect a material, such as a storage element material, from damage during subsequent manufacturing processes by forming a liner that may be bonded using a strong or weak bond.
Key Features and Innovation:
- Formation of a protective liner to safeguard materials from damage during manufacturing processes.
- Use of strong or weak bonds to attach the liner to the material.
- Application of sealant material during etching phases to prevent damage during subsequent etching operations.
Potential Applications: The technology can be applied in various manufacturing processes where materials need protection from damage during subsequent operations.
Problems Solved: The technology addresses the issue of material damage during manufacturing processes, ensuring the integrity of the materials throughout the production.
Benefits:
- Enhanced protection for materials during manufacturing processes.
- Improved efficiency and quality in manufacturing operations.
- Reduction in material wastage and rework.
Commercial Applications: The technology can be utilized in semiconductor manufacturing, storage device production, and other industries where material protection is crucial for product quality and performance.
Prior Art: Readers can explore prior patents related to material protection during manufacturing processes to gain a deeper understanding of the technological advancements in this field.
Frequently Updated Research: Stay informed about the latest research developments in material protection techniques during manufacturing processes to ensure the application of the most current and effective methods.
Questions about Material Protection Techniques: 1. What are the key benefits of using a protective liner in manufacturing processes? 2. How does the application of sealant material during etching phases contribute to preventing material damage?
Original Abstract Submitted
techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. the liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. in some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.