18507008. APPARATUS FOR PROCESSING SUBSTRATE simplified abstract (SEMES CO., LTD.)

APPARATUS FOR PROCESSING SUBSTRATE

Organization Name

SEMES CO., LTD.

Inventor(s)

Won Sik Son of Gyeonggi-do (KR)

Ho Jong Hwang of Gyeonggi-do (KR)

Hyun Goo Park of Gyeonggi-do (KR)

APPARATUS FOR PROCESSING SUBSTRATE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18507008 titled 'APPARATUS FOR PROCESSING SUBSTRATE

Simplified Explanation: The patent application describes a substrate processing apparatus that utilizes a supercritical fluid to remove floating particles. The apparatus includes vessels that can be opened and closed, a clamping unit to secure the vessels in a closed position, and an intake unit to capture particles between the vessels.

• Key Features and Innovation:

   - Utilizes a supercritical fluid for substrate processing.
   - Vessels can be opened and closed for easy access to the processing space.
   - Clamping unit ensures a secure seal in the closed position.
   - Intake unit captures floating particles between the vessels.

• Potential Applications:

   - Semiconductor manufacturing
   - Optics and lens production
   - Microelectronics fabrication

• Problems Solved:

   - Removal of floating particles during substrate processing
   - Ensuring a clean processing environment
   - Improving the quality of finished substrates

• Benefits:

   - Enhanced substrate quality
   - Increased efficiency in processing
   - Reduced contamination risks

• Commercial Applications:

   - "Supercritical Fluid Substrate Processing Apparatus for Semiconductor Manufacturing"
   - This technology can be used in cleanroom environments for various industries requiring precise substrate processing.

• Prior Art:

   - Researchers can explore prior patents related to supercritical fluid applications in substrate processing to understand the evolution of this technology.

• Frequently Updated Research:

   - Stay updated on advancements in supercritical fluid technology for substrate processing to enhance the efficiency and effectiveness of the apparatus.

Questions about Substrate Processing Apparatus using Supercritical Fluid:

1. What are the potential drawbacks of using supercritical fluid in substrate processing?

   - Answer: While supercritical fluid offers advantages in particle removal, challenges may include high equipment costs and complex maintenance requirements.

2. How does the clamping unit contribute to the effectiveness of the apparatus?

   - Answer: The clamping unit ensures a tight seal between the vessels, preventing leaks and maintaining a controlled processing environment.

Original Abstract Submitted

A substrate processing apparatus using a supercritical fluid that can remove floating particles is provided. The substrate processing apparatus comprises a vessel including a processing space for processing a substrate, and a first vessel and a second vessel configured to be combined to be open and closed, wherein the first vessel and the second vessel seal the processing space in a closed position, and the first vessel and the second vessel open the processing space in an open position; a clamping unit configured to clamp the first vessel and the second vessel in the closed position; and an intake unit configured to intake a particle by including an intake member positioned to correspond to an open space between the first vessel and the second vessel in the open position.