18467889. TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION simplified abstract (FUJIFILM CORPORATION)
Contents
- 1 TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION
Organization Name
Inventor(s)
Kunihiko Kodama of Fujinomiya-shi (JP)
Keigo Yamaguchi of Fujinomiya-shi (JP)
TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION - A simplified explanation of the abstract
This abstract first appeared for US patent application 18467889 titled 'TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION
Simplified Explanation
The present invention relates to a transfer film and a photosensitive composition for forming a film with excellent low moisture permeability and scratch resistance. The transfer film includes a temporary support and a photosensitive layer containing a polymer A and a compound β, where the polymer A has a repeating unit (a) with a carboxy group linked to a main chain by a linking group with 1 or more carbon atoms, and the compound β reduces the amount of carboxy group in the polymer A upon exposure.
- Polymer A contains a repeating unit with a carboxy group linked to a main chain.
- Compound β reduces the amount of carboxy group in the polymer A upon exposure.
Potential Applications
The technology can be used in:
- Packaging materials
- Electronic displays
- Medical devices
Problems Solved
The technology addresses issues related to:
- Moisture permeability in films
- Scratch resistance in films
Benefits
The benefits of this technology include:
- Improved film quality
- Enhanced durability
- Extended product lifespan
Potential Commercial Applications
The technology can be applied in various industries such as:
- Packaging
- Electronics
- Healthcare
Possible Prior Art
Prior art related to transfer films and photosensitive compositions may exist in the field of film manufacturing and coating technologies.
Unanswered Questions
1. How does the compound β specifically reduce the amount of carboxy group in the polymer A upon exposure? 2. Are there any specific industries or applications where this technology would not be suitable or effective?
Original Abstract Submitted
An object of the present invention is to provide a transfer film and a photosensitive composition, with which a film having excellent low moisture permeability and excellent scratch resistance can be formed. The transfer film of the present invention is a transfer film including a temporary support and a photosensitive layer, in which the photosensitive layer contains a polymer A and a compound β, the polymer A has a repeating unit (a) having a carboxy group linked to a main chain by a linking group having 1 or more carbon atoms, and the compound β has a structure b0 which reduces an amount of the carboxy group included in the polymer A by exposure.
