18080555. ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION simplified abstract (Applied Materials, Inc.)
Contents
ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
Organization Name
Inventor(s)
Costel Biloiu of Rockport MA (US)
Adam Calkins of Newmarket NH (US)
Tyler Rockwell of Wakefield MA (US)
Kevin M. Daniels of Lynnfield MA (US)
Christopher Campbell of Newburyport MA (US)
ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION - A simplified explanation of the abstract
This abstract first appeared for US patent application 18080555 titled 'ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
The patent application describes a processing system with a plasma chamber and extraction optics, including an extraction plate with at least one extraction aperture and a beam blocker with a boomerang shape.
- The processing system includes a plasma chamber and extraction optics.
- The extraction optics consist of an extraction plate with at least one extraction aperture.
- A beam blocker, made of a first metallic material, overlaps the extraction aperture and has a boomerang shape.
- The extraction plate, made of a second metallic material, is towards the inner side of the extraction plate.
- A substrate platen, movable along a scan direction, is located outside the plasma chamber.
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Solar panel production
Problems Solved: - Control of plasma beam extraction - Precision in material processing - Enhanced substrate coverage
Benefits: - Improved processing accuracy - Increased efficiency in material deposition - Enhanced control over plasma beam direction
Commercial Applications: Title: Advanced Plasma Processing System for Semiconductor Manufacturing This technology can revolutionize the semiconductor industry by offering precise control over material processing, leading to higher quality products and increased production efficiency.
Prior Art: Researchers can explore prior patents related to plasma processing systems, extraction optics, and beam blockers to understand the evolution of this technology.
Frequently Updated Research: Researchers can stay updated on advancements in plasma processing systems, material deposition techniques, and semiconductor manufacturing processes to enhance their understanding of this technology.
Questions about Plasma Processing Systems: 1. How does the extraction plate impact the efficiency of material processing in the plasma chamber? 2. What are the key differences between traditional plasma processing systems and the innovative system described in the patent application?
Original Abstract Submitted
A processing system may include a plasma chamber and an extraction optics, disposed along a side of the plasma chamber. The extraction optics may include an extraction plate, having an outer side and an inner side, where the extraction plate defines at least one extraction aperture. The extraction optics may include a beam blocker, overlapping the at least one extraction aperture, and disposed towards the inner side of the extraction plate. The beam blocker may have a cross-section that defines a boomerang shape, and may comprise a first metallic material, where the extraction plate comprises a second metallic material. The processing system may further include a substrate platen, disposed outside of the plasma chamber, and movable along a scan direction with respect to the extraction aperture.
