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Bibliographic details for 18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- Page name: 18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 22 March 2024 08:17 UTC
- Date retrieved: 27 September 2024 19:51 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748
- Page Version ID: 41748
Citation styles for 18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
APA style
18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.). (2024, March 22). WikiPatents, . Retrieved 19:51, September 27, 2024 from http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748.
MLA style
"18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)." WikiPatents, . 22 Mar 2024, 08:17 UTC. 27 Sep 2024, 19:51 <http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748>.
MHRA style
WikiPatents contributors, '18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)', WikiPatents, , 22 March 2024, 08:17 UTC, <http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748> [accessed 27 September 2024]
Chicago style
WikiPatents contributors, "18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748 (accessed September 27, 2024).
CBE/CSE style
WikiPatents contributors. 18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) [Internet]. WikiPatents, ; 2024 Mar 22, 08:17 UTC [cited 2024 Sep 27]. Available from: http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748.
Bluebook style
18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.), http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748 (last visited September 27, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748", note = "[Online; accessed 27-September-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=18516630._PELLICLE_FOR_AN_EUV_LITHOGRAPHY_MASK_AND_A_METHOD_OF_MANUFACTURING_THEREOF_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Co.,_Ltd.)&oldid=41748}", note = "[Online; accessed 27-September-2024]" }