SUBSTRATE MANUFACTURING EQUIPMENT COMPREHENSIVE DIGITAL TWIN FLEET

Organization Name

applied materials, inc.

Inventor(s)

Adolph Miller Allen of Oakland CA (US)

Karthik Ramanathan of Bangalore (IN)

Girish Venkatachalapathy of Alzenau (IN)

Umesh M. Kelkar of Santa Clara CA (US)

Kasturi Tulashidas Sarang of San Jose CA (US)

Yimeng Lyu of Mountain View CA (US)

Weize Hu of Sunnyvale CA (US)

Ying Teng of Pacheco CA (US)

Sejune Cheon of Seoul (KR)

Shiqi Dong of Milpitas CA (US)

Paul Gerard Kiely of Santa Cruz CA (US)

Milan Prakash of Bangalore (IN)

SUBSTRATE MANUFACTURING EQUIPMENT COMPREHENSIVE DIGITAL TWIN FLEET

This abstract first appeared for US patent application 20250086357 titled 'SUBSTRATE MANUFACTURING EQUIPMENT COMPREHENSIVE DIGITAL TWIN FLEET

Original Abstract Submitted

a method, apparatus, and system for controlling a multi-chamber process system for substrate processing are described herein. in some embodiments, a method comprises determining, by each digital twin device, of a plurality of digital twin devices, a first data set associated with at least one process chamber of a plurality of chamber processes, and the corresponding processes for processing a plurality of substrates. each digital twin device comprises one or more computational models. the first data set comprises measurements reported by probes or sensors within the at least one chamber process, or data collected and reported by internal sensors of the digital twin device. the method further automatically generating, by each digital twin device a second data set based on, at least in part, the first data set, and by executing one or more computational models of the digital twin device.