MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD OF PROCESSING A MIRROR

Abstract: a microlithographic projection exposure mirror has an optical effective surface (), a mirror substrate (), a reflection layer system () reflecting electromagnetic radiation incident on the optical effective surface, and at least one piezoelectric layer () arranged between the substrate and the reflection layer system. an electric field for producing a locally variable deformation is applied by a first electrode arrangement () situated on the side of the piezoelectric layer facing the reflection layer system, and by a second electrode arrangement () situated on the side of the piezoelectric layer facing the mirror substrate. a layer () of amorphous material which is compaction-sensitive on exposure to low-energy electron beam radiation and which is arranged on the side of the piezoelectric layer facing the reflection layer system has a thickness of at least 20 �m.

Inventor(s): Eric EVA, Matthias KAES

CPC Classification: G02B26/0858 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS)

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