US Patent Application 18299892. LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
Contents
LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD
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Inventor(s)
LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18299892 titled 'LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The patent application describes a lithography device that is used to form patterns on a substrate.
- The device includes a pattern forming unit that uses a pattern unit to form patterns on the substrate.
- An acquisition unit is used to acquire relationships between the positional deviation of the substrate, the holding force applied to the substrate, and the overlapping error between the substrate and the pattern unit.
- A measurement unit is used to measure the positional deviation of the substrate.
- A control unit is used to adjust the holding force applied to the substrate in order to reduce the overlapping error between the substrate and the pattern unit.
- The control unit uses the measured positional deviation and the acquired relationships to make adjustments.
Original Abstract Submitted
A lithography device includes: a pattern forming unit that forms a pattern in a shot region on a substrate held by a substrate holding unit by using a pattern unit; an acquisition unit that acquires relationships among the amount of positional deviation of the substrate relative to the substrate holding unit, a holding force applied to at least a part of the substrate to hold the substrate, and an overlapping error between the substrate and the pattern unit; a measurement unit that measures the amount of positional deviation of the substrate relative to the substrate holding unit; and a control unit that controls the holding force to reduce the overlapping error between the substrate and the pattern unit on the basis of the amount of positional deviation measured by the measuring unit and the relationships acquired by the acquisition unit.
