US Patent Application 18187082. LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
Contents
- 1 LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Original Abstract Submitted
LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
ATSUSHI Kusaka of Tochigi (JP)
LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 18187082 Titled 'LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD'
Simplified Explanation
The abstract describes a lithography information processing apparatus that is designed to optimize the alignment adjustment of a substrate. The apparatus includes a display control unit that displays the layout of a shot region of the substrate used in a lithography apparatus. It also displays the position of an effective chip in each shot region based on the number of chips included in that region.
Original Abstract Submitted
In order to provide a lithography information processing apparatus that can optimize, for example, adjustment of alignment at an outer circumferential part of a substrate, the lithography information processing apparatus includes a display control unit that causes a layout of a shot region of the substrate used in a lithography apparatus to be displayed and causes a position of an effective chip in each of the shot regions to be displayed according to the number of chips included in each of the shot regions.
