US Patent Application 18076591. SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS simplified abstract
Contents
- 1 SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS
- 1.1 Organization Name
- 1.2 SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
- 1.3 Simplified Explanation
- 1.4 Original Abstract Submitted
SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS
Organization Name
SAMSUNG ELECTRONICS CO., LTD.==Inventor(s)==
[[Category:Sangjine Park of Suwon-si (KR)]]
[[Category:Ji Hwan Park of Suwon-si (KR)]]
[[Category:Kuntack Lee of Suwon-si (KR)]]
SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18076591 titled 'SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS
Simplified Explanation
- The patent application describes a substrate processing apparatus that includes a wetting apparatus, a substrate weight measurement apparatus, and a drying apparatus. - The wetting apparatus supplies a fluid onto a substrate. - The substrate weight measurement apparatus measures the weight of the substrate that has passed through the wetting apparatus. - The drying apparatus dries the substrate that has passed through the substrate weight measurement apparatus. - The substrate weight measurement apparatus includes a measurement chamber with a measurement space. - Inside the measurement chamber, there is a measurement stage where the substrate is placed. - The weight sensing sensor is used to sense the weight of the substrate on the measurement stage.
Original Abstract Submitted
A substrate processing apparatus includes a wetting apparatus that supplies a fluid onto a substrate, a substrate weight measurement apparatus that measures a weight of the substrate which has passed through the wetting apparatus, and a drying apparatus that dries the substrate which has passed through the substrate weight measurement apparatus. The substrate weight measurement apparatus includes a measurement chamber providing a measurement space, a measurement stage in the measurement chamber, and a weight sensing sensor that senses the weight of the substrate disposed on the measurement stage.