Taiwan semiconductor manufacturing company, ltd. (20240111935). INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM simplified abstract
Contents
- 1 INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Ke-Ying Su of Taipei City (TW)
INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240111935 titled 'INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM
Simplified Explanation
The method described in the abstract involves generating an IC layout diagram by configuring a delta resistance network based on the location of a gate via within the active region. This network is then used to perform a simulation for the IC layout.
- Receiving an IC layout diagram with active region, gate region, and gate via
- Configuring a delta resistance network with resistance values based on location and edges
- Performing a simulation based on the delta resistance network
Potential Applications
This technology could be applied in the semiconductor industry for designing and optimizing integrated circuit layouts.
Problems Solved
This method helps in accurately simulating the behavior of IC layouts, allowing for better design decisions and optimizations.
Benefits
The use of a delta resistance network can provide more precise simulations, leading to improved performance and reliability of integrated circuits.
Potential Commercial Applications
One potential commercial application of this technology could be in the development of advanced semiconductor devices for various electronic products.
Possible Prior Art
Prior art in the field of semiconductor design and simulation tools may exist, but specific examples are not provided in the abstract.
Unanswered Questions
How does this method compare to existing simulation techniques in terms of accuracy and efficiency?
The abstract does not provide information on how this method compares to other simulation techniques in terms of accuracy and efficiency.
Are there any limitations or constraints when applying this method to different types of IC layouts?
The abstract does not mention any limitations or constraints that may arise when applying this method to different types of IC layouts.
Original Abstract Submitted
a method of generating an ic layout diagram includes receiving the ic layout diagram including an active region, a gate region extending across the active region from a first active region edge to a second active region edge, and a gate via positioned at a location along the gate region between the first and second edges, configuring a delta resistance network including the first and second edges, a midpoint between the first and second edges, and resistance values based on the location and first and second edges, and performing a simulation based on the delta resistance network.
