Cite This Page
Bibliographic details for Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract
- Page name: Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 26 April 2024 04:18 UTC
- Date retrieved: 27 May 2024 12:03 UTC
- Permanent URL: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930
- Page Version ID: 56930
Citation styles for Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract
APA style
Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract. (2024, April 26). WikiPatents, . Retrieved 12:03, May 27, 2024 from http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930.
MLA style
"Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract." WikiPatents, . 26 Apr 2024, 04:18 UTC. 27 May 2024, 12:03 <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930>.
MHRA style
WikiPatents contributors, 'Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract', WikiPatents, , 26 April 2024, 04:18 UTC, <http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930> [accessed 27 May 2024]
Chicago style
WikiPatents contributors, "Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract," WikiPatents, , http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930 (accessed May 27, 2024).
CBE/CSE style
WikiPatents contributors. Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract [Internet]. WikiPatents, ; 2024 Apr 26, 04:18 UTC [cited 2024 May 27]. Available from: http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930.
Bluebook style
Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract, http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930 (last visited May 27, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930",
note = "[Online; accessed 27-May-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "Taiwan semiconductor manufacturing company, ltd. (20240136401). PASSIVATION LAYER FOR EPITAXIAL SEMICONDUCTOR PROCESS simplified abstract --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=Taiwan_semiconductor_manufacturing_company,_ltd._(20240136401)._PASSIVATION_LAYER_FOR_EPITAXIAL_SEMICONDUCTOR_PROCESS_simplified_abstract&oldid=56930}",
note = "[Online; accessed 27-May-2024]"
}
