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Bibliographic details for 18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

Citation styles for 18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

APA style

18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, March 16). WikiPatents, . Retrieved 17:43, May 10, 2024 from http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381.

MLA style

"18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 16 Mar 2024, 23:56 UTC. 10 May 2024, 17:43 <http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381>.

MHRA style

WikiPatents contributors, '18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 16 March 2024, 23:56 UTC, <http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381> [accessed 10 May 2024]

Chicago style

WikiPatents contributors, "18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381 (accessed May 10, 2024).

CBE/CSE style

WikiPatents contributors. 18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Mar 16, 23:56 UTC [cited 2024 May 10]. Available from: http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381.

Bluebook style

18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381 (last visited May 10, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381",
   note = "[Online; accessed 10-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=18516703._SEMICONDUCTOR_PROCESSING_APPARATUS_AND_METHOD_UTILIZING_ELECTROSTATIC_DISCHARGE_(ESD)_PREVENTION_LAYER_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37381}",
   note = "[Online; accessed 10-May-2024]"
 }


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