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Bibliographic details for 18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Page name: 18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 17 March 2024 00:02 UTC
- Date retrieved: 15 May 2024 10:33 UTC
- Permanent URL: http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450
- Page Version ID: 37450
Citation styles for 18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
APA style
18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.). (2024, March 17). WikiPatents, . Retrieved 10:33, May 15, 2024 from http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450.
MLA style
"18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)." WikiPatents, . 17 Mar 2024, 00:02 UTC. 15 May 2024, 10:33 <http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450>.
MHRA style
WikiPatents contributors, '18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)', WikiPatents, , 17 March 2024, 00:02 UTC, <http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450> [accessed 15 May 2024]
Chicago style
WikiPatents contributors, "18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450 (accessed May 15, 2024).
CBE/CSE style
WikiPatents contributors. 18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) [Internet]. WikiPatents, ; 2024 Mar 17, 00:02 UTC [cited 2024 May 15]. Available from: http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450.
Bluebook style
18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.), http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450 (last visited May 15, 2024).
BibTeX entry
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450",
note = "[Online; accessed 15-May-2024]"
}
When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx,
author = "WikiPatents",
title = "18508788. MELT ANNEAL SOURCE AND DRAIN REGIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.) --- WikiPatents{,} ",
year = "2024",
url = "\url{http://wikipatents.org/index.php?title=18508788._MELT_ANNEAL_SOURCE_AND_DRAIN_REGIONS_simplified_abstract_(Taiwan_Semiconductor_Manufacturing_Company,_Ltd.)&oldid=37450}",
note = "[Online; accessed 15-May-2024]"
}
