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Bibliographic details for 17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

Citation styles for 17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APA style

17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.). (2024, January 3). WikiPatents, . Retrieved 16:09, May 20, 2024 from http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870.

MLA style

"17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)." WikiPatents, . 3 Jan 2024, 01:50 UTC. 20 May 2024, 16:09 <http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870>.

MHRA style

WikiPatents contributors, '17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)', WikiPatents, , 3 January 2024, 01:50 UTC, <http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870> [accessed 20 May 2024]

Chicago style

WikiPatents contributors, "17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870 (accessed May 20, 2024).

CBE/CSE style

WikiPatents contributors. 17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) [Internet]. WikiPatents, ; 2024 Jan 3, 01:50 UTC [cited 2024 May 20]. Available from: http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870.

Bluebook style

17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.), http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870 (last visited May 20, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870",
   note = "[Online; accessed 20-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17841734._MASK_LAYOUT_CORRECTION_METHODS_BASED_ON_MACHINE_LEARNING,_AND_MASK_MANUFACTURING_METHODS_INCLUDING_THE_CORRECTION_METHODS_simplified_abstract_(SAMSUNG_ELECTRONICS_CO.,_LTD.)&oldid=21870}",
   note = "[Online; accessed 20-May-2024]"
 }


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