Cite This Page

Jump to navigation Jump to search

Bibliographic details for 17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)

Citation styles for 17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)

APA style

17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.). (2024, January 2). WikiPatents, . Retrieved 12:48, May 10, 2024 from http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835.

MLA style

"17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)." WikiPatents, . 2 Jan 2024, 06:18 UTC. 10 May 2024, 12:48 <http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835>.

MHRA style

WikiPatents contributors, '17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)', WikiPatents, , 2 January 2024, 06:18 UTC, <http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835> [accessed 10 May 2024]

Chicago style

WikiPatents contributors, "17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)," WikiPatents, , http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835 (accessed May 10, 2024).

CBE/CSE style

WikiPatents contributors. 17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.) [Internet]. WikiPatents, ; 2024 Jan 2, 06:18 UTC [cited 2024 May 10]. Available from: http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835.

Bluebook style

17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.), http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835 (last visited May 10, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835",
   note = "[Online; accessed 10-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17695062. PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17695062._PLASMA_ETCHING_APPARATUS_AND_SEMICONDUCTOR_PROCESSING_SYSTEM_simplified_abstract_(Samsung_Electronics_Co.,_Ltd.)&oldid=20835}",
   note = "[Online; accessed 10-May-2024]"
 }


Retrieved from "http://wikipatents.org/index.php?title=Special:CiteThisPage"