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Bibliographic details for 17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

Citation styles for 17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

APA style

17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.). (2024, January 2). WikiPatents, . Retrieved 15:13, May 10, 2024 from http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319.

MLA style

"17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)." WikiPatents, . 2 Jan 2024, 04:55 UTC. 10 May 2024, 15:13 <http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319>.

MHRA style

WikiPatents contributors, '17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)', WikiPatents, , 2 January 2024, 04:55 UTC, <http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319> [accessed 10 May 2024]

Chicago style

WikiPatents contributors, "17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)," WikiPatents, , http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319 (accessed May 10, 2024).

CBE/CSE style

WikiPatents contributors. 17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) [Internet]. WikiPatents, ; 2024 Jan 2, 04:55 UTC [cited 2024 May 10]. Available from: http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319.

Bluebook style

17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.), http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319 (last visited May 10, 2024).

BibTeX entry

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319",
   note = "[Online; accessed 10-May-2024]"
 }

When using the LaTeX package url (\usepackage{url} somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred: 

 @misc{ wiki:xxx,
   author = "WikiPatents",
   title = "17461849. Multiple Gate Field-Effect Transistors Having Various Gate Oxide Thicknesses and Methods of Forming the Same simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) --- WikiPatents{,} ",
   year = "2024",
   url = "\url{http://wikipatents.org/index.php?title=17461849._Multiple_Gate_Field-Effect_Transistors_Having_Various_Gate_Oxide_Thicknesses_and_Methods_of_Forming_the_Same_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20319}",
   note = "[Online; accessed 10-May-2024]"
 }


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