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Bibliographic details for 17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation)
- Page name: 17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation)
- Author: WikiPatents contributors
- Publisher: WikiPatents, .
- Date of last revision: 4 January 2024 05:27 UTC
- Date retrieved: 17 May 2024 07:49 UTC
- Permanent URL: http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167
- Page Version ID: 25167
Citation styles for 17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation)
APA style
17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation). (2024, January 4). WikiPatents, . Retrieved 07:49, May 17, 2024 from http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167.
MLA style
"17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation)." WikiPatents, . 4 Jan 2024, 05:27 UTC. 17 May 2024, 07:49 <http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167>.
MHRA style
WikiPatents contributors, '17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation)', WikiPatents, , 4 January 2024, 05:27 UTC, <http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167> [accessed 17 May 2024]
Chicago style
WikiPatents contributors, "17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation)," WikiPatents, , http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167 (accessed May 17, 2024).
CBE/CSE style
WikiPatents contributors. 17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation) [Internet]. WikiPatents, ; 2024 Jan 4, 05:27 UTC [cited 2024 May 17]. Available from: http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167.
Bluebook style
17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation), http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167 (last visited May 17, 2024).
BibTeX entry
@misc{ wiki:xxx, author = "WikiPatents", title = "17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation) --- WikiPatents{,} ", year = "2024", url = "http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167", note = "[Online; accessed 17-May-2024]" }
When using the LaTeX package url (\usepackage{url}
somewhere in the preamble) which tends to give much more nicely formatted web addresses, the following may be preferred:
@misc{ wiki:xxx, author = "WikiPatents", title = "17456402. APPLYING INERT ION BEAM ETCHING FOR IMPROVING A PROFILE AND REPAIRING SIDEWALL DAMAGE FOR PHASE CHANGE MEMORY DEVICES simplified abstract (International Business Machines Corporation) --- WikiPatents{,} ", year = "2024", url = "\url{http://wikipatents.org/index.php?title=17456402._APPLYING_INERT_ION_BEAM_ETCHING_FOR_IMPROVING_A_PROFILE_AND_REPAIRING_SIDEWALL_DAMAGE_FOR_PHASE_CHANGE_MEMORY_DEVICES_simplified_abstract_(International_Business_Machines_Corporation)&oldid=25167}", note = "[Online; accessed 17-May-2024]" }