Samsung electronics co., ltd. (20240125709). SEMICONDUCTOR MEASUREMENT APPARATUS simplified abstract
Contents
- 1 SEMICONDUCTOR MEASUREMENT APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
SEMICONDUCTOR MEASUREMENT APPARATUS
Organization Name
Inventor(s)
SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240125709 titled 'SEMICONDUCTOR MEASUREMENT APPARATUS
Simplified Explanation
The semiconductor measurement apparatus described in the abstract is a device that uses different wavelengths of light to measure structures within a test object. The apparatus includes an illuminator, a stage for the test object, a camera, and a controller.
- The illuminator outputs light with two different wavelength bands.
- The camera receives light reflected, scattered, or transmitted through the test object.
- The controller controls the illuminator and camera to measure structures within the test object based on the received light.
- The controller adjusts the exposure time of the camera based on the wavelength of light being used.
Potential Applications
This technology can be used in semiconductor manufacturing for quality control and inspection of structures within semiconductor devices.
Problems Solved
This technology solves the problem of accurately measuring and inspecting small structures within semiconductor devices.
Benefits
The benefits of this technology include improved accuracy in measurement, faster inspection processes, and increased quality control in semiconductor manufacturing.
Potential Commercial Applications
A potential commercial application of this technology could be in the semiconductor industry for quality control and inspection of semiconductor devices.
Possible Prior Art
One possible prior art for this technology could be existing semiconductor inspection systems that use different wavelengths of light for measurement and inspection purposes.
Unanswered Questions
How does the controller determine the appropriate exposure time for the camera based on the wavelength of light being used?
The controller likely has pre-programmed algorithms or settings that correlate different exposure times with specific wavelengths of light to ensure accurate measurements.
Are there any limitations to the size or type of structures that can be measured using this technology?
The size and type of structures that can be accurately measured may be limited by the resolution of the camera and the capabilities of the illuminator in terms of the wavelengths of light it can produce.
Original Abstract Submitted
a semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or scattered from the test object or transmitted through the test object, and a controller configured to control the illuminator and the camera, and to measure, based on information indicated by the light received by the camera, a plurality of structures included in the test object. the controller is configured to set an exposure time of the camera to a first exposure time while the illuminator outputs the light having the first wavelength band, and to set the exposure time of the camera to a second exposure time, different from the first exposure time, while the illuminator outputs the light having the second wavelength band.