Samsung electronics co., ltd. (20240124635). POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION simplified abstract
Contents
- 1 POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION
Organization Name
Inventor(s)
Haengdeog Koh of Suwon-si, (KR)
Yoonhyun Kwak of Suwon-si, (KR)
Beomseok Kim of Suwon-si, (KR)
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240124635 titled 'POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION
Simplified Explanation
The abstract of the patent application describes a polymer and resist composition for forming patterns, with the polymer containing specific repeating units and being free of repeating units that change structure by an acid.
- The polymer in the resist composition includes specific repeating units represented by formula 1 and formula 2.
- The polymer does not contain repeating units that undergo structural changes due to an acid.
- The resist composition is used in a method for forming patterns.
Potential Applications
The technology described in this patent application could be applied in the following areas:
- Semiconductor manufacturing
- Photolithography processes
- Microelectronics industry
Problems Solved
This technology addresses the following issues:
- Improving pattern formation accuracy
- Enhancing resist performance
- Minimizing structural changes due to acid exposure
Benefits
The benefits of this technology include:
- Increased precision in pattern formation
- Enhanced resistance to acid-induced structural changes
- Improved overall performance of resist compositions
Potential Commercial Applications
The potential commercial applications of this technology could include:
- Production of advanced electronic devices
- Manufacturing of high-resolution displays
- Development of cutting-edge optical components
Possible Prior Art
One possible prior art in this field could be the use of polymers with different repeating units for resist compositions in lithography processes.
Unanswered Questions
How does this technology compare to existing resist compositions in terms of performance and cost-effectiveness?
This article does not provide a direct comparison with existing resist compositions in terms of performance and cost-effectiveness. Further research or testing may be needed to evaluate these aspects.
What are the specific limitations or constraints of using this polymer in resist compositions for pattern formation?
The article does not delve into the specific limitations or constraints of using this polymer in resist compositions for pattern formation. Additional studies or experiments may be required to identify any potential drawbacks or challenges associated with its application.
Original Abstract Submitted
provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by formula 1 and a second repeating unit represented by formula 2, and free of a repeating unit of which a structure changes by an acid:
