Samsung electronics co., ltd. (20240098985). SEMICONDUCTOR DEVICE simplified abstract
Contents
- 1 SEMICONDUCTOR DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240098985 titled 'SEMICONDUCTOR DEVICE
Simplified Explanation
The semiconductor device described in the abstract includes a substrate with at least one active region defined by an isolation layer. It also features word lines and bit lines that intersect at an acute angle, with direct contacts connecting the bit lines to the active region.
- The semiconductor device includes a substrate with at least one active region defined by an isolation layer.
- Word lines extend in a first horizontal direction inside the substrate, crossing the active region.
- Bit lines extend in a second horizontal direction orthogonal to the word lines, at a higher vertical level.
- Direct contacts electrically connect the bit lines to the active region, with a maximum width in a third horizontal direction.
Potential Applications
This technology could be applied in:
- Memory devices
- Logic circuits
- Microprocessors
Problems Solved
This technology helps in:
- Improving data storage and retrieval
- Enhancing circuit performance
- Increasing integration density
Benefits
The benefits of this technology include:
- Faster data processing
- Higher efficiency
- Compact design
Potential Commercial Applications
This technology could be commercially applied in:
- Consumer electronics
- Telecommunications
- Automotive industry
Possible Prior Art
One possible prior art for this technology could be:
- Semiconductor devices with similar word line and bit line configurations.
Unanswered Questions
How does this technology compare to existing semiconductor devices in terms of performance and efficiency?
This article does not provide a direct comparison with existing semiconductor devices to evaluate its performance and efficiency.
What are the potential challenges in implementing this technology on a large scale?
The article does not address the potential challenges that may arise in implementing this technology on a large scale, such as manufacturing complexities or cost implications.
Original Abstract Submitted
a semiconductor device includes a substrate having at least one active region, the at least one active region being defined by an isolation layer, at least one word line extending in a first horizontal direction inside the substrate, the at least one word line crossing the at least one active region, at least one bit line extending in a second horizontal direction orthogonal to the first horizontal direction, the at least one bit line being at a higher vertical level than the at least one word line, and at least one direct contact electrically connecting the at least one bit line to the at least one active region, the at least one direct contact having a maximum width in a third horizontal direction, the third horizontal direction intersecting each of the first horizontal direction and the second horizontal direction at an acute angle.
