Samsung display co., ltd. (20240133021). DEPOSITION APPARATUS simplified abstract
Contents
- 1 DEPOSITION APPARATUS
DEPOSITION APPARATUS
Organization Name
Inventor(s)
Gan Young Park of Yongin-si (KR)
SUNGJONG Park of Yongin-si (KR)
DONGKIUN Seo of Yongin-si (KR)
DEPOSITION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240133021 titled 'DEPOSITION APPARATUS
Simplified Explanation
The deposition apparatus described in the abstract includes a vaporization portion for vaporizing three different materials and a first nozzle portion connected adjacent to the vaporization portion, which includes three nozzle holes to discharge each material separately.
- Vaporization portion for vaporizing a first, second, and third material
- First nozzle portion with three nozzle holes to discharge each material separately
Potential Applications
The technology could be used in the manufacturing of semiconductors, thin film coatings, and solar cells.
Problems Solved
This technology allows for precise deposition of multiple materials in a controlled manner, reducing waste and improving efficiency in the deposition process.
Benefits
- Precise deposition of multiple materials - Controlled discharge of each material - Improved efficiency in the deposition process
Potential Commercial Applications
"Multi-Material Deposition Apparatus for Semiconductor Manufacturing"
Possible Prior Art
There are similar deposition apparatuses on the market that can deposit multiple materials, but the specific design of this apparatus with three separate nozzle holes for each material may be unique.
What is the cost of this technology compared to existing deposition methods?
The cost-effectiveness of this technology compared to existing deposition methods is not addressed in the abstract. It would be important to know if the benefits of precise deposition and improved efficiency outweigh any potential increase in cost.
How does this technology compare to other multi-material deposition systems currently available?
The abstract does not provide information on how this technology compares to other multi-material deposition systems. Understanding the advantages and disadvantages of this apparatus in comparison to existing systems would be crucial for potential users looking to adopt this technology.
Original Abstract Submitted
a deposition apparatus includes: a vaporization portion to vaporize a first material, a second material, and a third material different from each other; and a first nozzle portion connected adjacent to the vaporization portion. the first nozzle portion includes: a first nozzle hole to discharge the first material; a second nozzle hole adjacent to the first nozzle hole and to discharge the second material; and a third nozzle hole adjacent to the first nozzle hole and the second nozzle hole and to discharge the third material.
