View source for PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR: abstract simplified (18313555)

*This abstract for appeared for patent application  number 18313555 Titled 'PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR'

==Simplified Explanation==

The abstract describes a photoacid generator, which is a chemical compound used in the production of photoresist compositions. The photoresist composition is a material used in the semiconductor industry for patterning and etching processes. The abstract also mentions a method for preparing the photoacid generator. The specific compound mentioned in the abstract is represented by Formula 1, but no further details are provided.


==Original Abstract Submitted==

Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: