Mitsubishi electric corporation (20240136235). METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
Contents
- 1 METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Organization Name
mitsubishi electric corporation
Inventor(s)
Keiichi Nakamura of Tokyo (JP)
METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240136235 titled 'METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Simplified Explanation
The method described in the patent application involves immersing a substrate with circuit patterns in pure water or a corrosive solution, applying voltage to the circuit patterns, and determining the substrate's quality based on the presence or absence of a tree-like structure formed due to the voltage application.
- Immersing substrate in pure water or corrosive solution
- Applying voltage to circuit patterns
- Determining substrate quality based on presence of tree-like structure
Potential Applications
This technology could be applied in the manufacturing industry for quality control of substrates with circuit patterns.
Problems Solved
This method helps in identifying defective products early in the manufacturing process, saving time and resources.
Benefits
- Improved quality control - Cost savings by identifying defective products early - Efficient manufacturing process
Potential Commercial Applications
"Quality Control Method for Substrate Manufacturing in Pure Water or Corrosive Solution" could be used in the semiconductor industry for ensuring the quality of substrates with circuit patterns.
Possible Prior Art
One possible prior art could be the use of voltage testing in the semiconductor industry to detect defects in circuit patterns on substrates.
Unanswered Questions
How does this method compare to traditional quality control methods in the semiconductor industry?
This method offers a more efficient and potentially cost-effective way of identifying defective products compared to traditional methods.
What are the potential environmental impacts of using corrosive solutions in the manufacturing process?
The use of corrosive solutions may raise concerns about proper disposal and environmental impact, which would need to be addressed in the implementation of this technology.
Original Abstract Submitted
a method for manufacturing a substrate according to the first disclosure includes immersing a substrate on which a plurality of circuit patterns are formed in pure water or a corrosive solution, applying voltage between the plurality of circuit patterns in a state in which the substrate is immersed in the pure water or the corrosive solution and determining the substrate to be a defective product when a tree is generated in the plurality of circuit patterns due to the voltage application and determining the substrate to be a non-defective product when the tree is not generated.
