Intel corporation (20240134269). ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS simplified abstract
Contents
- 1 ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS
Organization Name
Inventor(s)
Timothy C. Johnston of Sacramento CA (US)
Seongtae Jeong of Portland OR (US)
Talha Khan of HIllsboro OR (US)
Anjan Raghunathan of Portland OR (US)
ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240134269 titled 'ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS
Simplified Explanation
The patent application describes systems, methods, and devices related to optical proximity corrections to an integrated circuit photomask. Here are the key points:
- Identification of contours of adjacent polygons on a photomask for integrated circuit polygons.
- Generation of fast contour predictions based on corner rounding.
- Determination of minimum distances between contours for optical proximity corrections.
Potential Applications
The technology can be applied in the semiconductor industry for improving the accuracy of photomasks used in integrated circuit manufacturing processes.
Problems Solved
1. Enhances the precision of photomask designs for integrated circuits. 2. Helps in reducing errors and improving the overall quality of the manufacturing process.
Benefits
1. Increased accuracy in photomask designs. 2. Improved performance and reliability of integrated circuits. 3. Cost-effective solution for optimizing manufacturing processes.
Potential Commercial Applications
- "Optical Proximity Corrections in Integrated Circuit Photomasks: Enhancing Manufacturing Precision"
Possible Prior Art
There may be existing technologies or methods related to optical proximity corrections in the semiconductor industry, but specific prior art is not provided in this patent application.
Unanswered Questions
How does this technology impact the overall production time of integrated circuits?
The patent application does not mention the potential effects on production time or efficiency.
Are there any limitations to the size or complexity of integrated circuits that can benefit from this technology?
The scope of applicability of this technology to different sizes or complexities of integrated circuits is not discussed in the abstract.
Original Abstract Submitted
this disclosure describes systems, methods, and devices related to optical proximity corrections to an integrated circuit photomask. a method may include identifying a first contour of a first adjacent polygon of a photomask predicted for a first polygon of an integrated circuit, the first contour excluding a first corner formed by a first edge and a second edge of the first polygon; identifying a second contour of a second adjacent polygon of a photomask predicted for a second polygon of the integrated circuit, the second contour excluding a second corner formed by a third edge and a fourth edge of the second polygon; generating a fast contour prediction based on corner rounding associated with the first contour and the second contour; and generating, based on the fast contour prediction, a minimum distance between the first contour and the second contour, the minimum distance associated with the optical proximity corrections.
