Intel corporation (20240105248). TCAM WITH HYSTERETIC OXIDE MEMORY CELLS simplified abstract

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TCAM WITH HYSTERETIC OXIDE MEMORY CELLS

Organization Name

intel corporation

Inventor(s)

Abhishek Anil Sharma of Portland OR (US)

Tahir Ghani of Portland OR (US)

Sagar Suthram of Portland OR (US)

Anand Murthy of Portland OR (US)

Wilfred Gomes of Portland OR (US)

Pushkar Ranade of San Jose CA (US)

TCAM WITH HYSTERETIC OXIDE MEMORY CELLS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240105248 titled 'TCAM WITH HYSTERETIC OXIDE MEMORY CELLS

Simplified Explanation

The abstract describes an integrated circuit (IC) die with memory cells utilizing a hysteretic-oxide material, potentially for use in a ternary content-addressable memory (TCAM).

  • Memory cells in the IC die contain a storage circuit made of hysteretic-oxide material.
  • The IC die may be used in a ternary content-addressable memory (TCAM) application.

Potential Applications

The technology could be applied in:

  • High-speed data processing systems
  • Advanced computing devices

Problems Solved

The technology addresses issues related to:

  • Memory cell performance and efficiency
  • Data retrieval speed and accuracy

Benefits

The benefits of this technology include:

  • Improved memory cell reliability
  • Enhanced data processing capabilities

Potential Commercial Applications

A potential commercial application for this technology could be in:

  • Data centers for high-performance computing tasks

Possible Prior Art

Prior art may include:

  • Previous memory cell technologies utilizing different materials
  • Existing TCAM designs

Unanswered Questions

How does the hysteretic-oxide material compare to traditional memory cell materials in terms of performance and longevity?

The abstract does not provide a direct comparison between the hysteretic-oxide material and traditional memory cell materials. Further research or testing may be needed to determine the advantages and disadvantages of using this material.

What specific advancements in TCAM technology does the integration of hysteretic-oxide memory cells offer?

While the abstract mentions the potential use of hysteretic-oxide memory cells in a TCAM, it does not elaborate on the specific improvements or advancements this integration may bring to TCAM technology. Additional information or studies may be required to fully understand the impact of this innovation on TCAM performance.


Original Abstract Submitted

an integrated circuit (ic) die includes a substrate and an array of memory cells formed in or on the substrate with a memory cell of the array of memory cells that includes a storage circuit that comprises a hysteretic-oxide material. a ternary content-addressable memory (tcam) may utilize hysteretic-oxide memory cells. other embodiments are disclosed and claimed.