View source for INTEGRATED CIRCUIT DEVICES INCLUDING A PARAMETER MEASURING STRUCTURE AND METHODS OF FORMING THE SAME: abstract simplified (17837453)

*This abstract for appeared for patent application  number 17837453 Titled 'INTEGRATED CIRCUIT DEVICES INCLUDING A PARAMETER MEASURING STRUCTURE AND METHODS OF FORMING THE SAME'

==Simplified Explanation==

The abstract describes integrated circuit devices that consist of a cell transistor and a parameter measuring structure. The cell transistor is located on one side of a substrate structure, while the parameter measuring structure includes two contact structures that extend through the substrate structure. The second side of the substrate structure exposes parts of the contact structures.


==Original Abstract Submitted==

Integrated circuit devices may include a cell transistor and a parameter measuring structure (e.g., a resistance measuring structure). The cell transistor may be on a first surface of a substrate structure, which is opposite a second surface thereof. The parameter measuring structure may include first and second contact structures that extend through the substrate structure. The second surface of the substrate structure may expose respective portions of the first and second contact structures.