Canon kabushiki kaisha (20240134286). EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract
Contents
- 1 EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240134286 titled 'EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The abstract describes an exposure apparatus for exposing shot regions on a substrate, including a projection optical system, a drive mechanism, a detector, and a controller. The apparatus projects a pattern onto an exposure region, detects the surface height of the substrate, and controls the drive mechanism based on the detector's output.
- Projection optical system projects pattern onto substrate
- Drive mechanism moves substrate
- Detector detects surface height of substrate
- Controller controls drive mechanism based on detector output
Potential Applications
This technology could be used in semiconductor manufacturing, photolithography processes, and other industries requiring precise exposure of patterns on substrates.
Problems Solved
This technology solves the problem of accurately exposing shot regions on a substrate by incorporating a detector to measure surface height and a controller to adjust the drive mechanism accordingly.
Benefits
The benefits of this technology include improved accuracy in exposure processes, increased efficiency in manufacturing, and enhanced quality control in pattern projection.
Potential Commercial Applications
The potential commercial applications of this technology could be in semiconductor fabrication facilities, research institutions, and companies specializing in high-precision manufacturing processes.
Possible Prior Art
One possible prior art for this technology could be similar exposure apparatuses used in the semiconductor industry for photolithography processes. These systems may have incorporated projection optical systems, drive mechanisms, detectors, and controllers for substrate movement and exposure control.
Unanswered Questions
How does the detector measure the surface height of the substrate?
The abstract mentions that the detector is configured to detect the surface height of the substrate, but it does not provide details on the specific mechanism or technology used for this measurement.
What is the level of precision achieved by this exposure apparatus?
While the abstract describes the apparatus's ability to control the drive mechanism based on the detector's output, it does not specify the level of precision or accuracy that can be achieved in exposing the shot regions on the substrate.
Original Abstract Submitted
an exposure apparatus for exposing a plurality of shot regions on a substrate includes a projection optical system, a drive mechanism configured to drive the substrate, a detector configured to detect a surface height of the substrate, and a controller configured to control the drive mechanism based on an output of the detector. the projection optical system is configured to project a pattern of an original to an exposure region in an image plane of the projection optical system. a detection region of the detector is larger than the exposure region. the controller is configured to control, based on an output of the detector obtained when a first shot region of the plurality of shot regions is arranged in the exposure region, driving of the substrate, by the drive mechanism, for exposing a second shot region of the plurality of shot regions.
