Canon kabushiki kaisha (20240130211). DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC LIGHT-EMITTING ELEMENT simplified abstract

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DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC LIGHT-EMITTING ELEMENT

Organization Name

canon kabushiki kaisha

Inventor(s)

MASUMI Itabashi of Kanagawa (JP)

HIROYUKI Mochizuki of Kanagawa (JP)

TATSURO Uchida of Tokyo (JP)

DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC LIGHT-EMITTING ELEMENT - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240130211 titled 'DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC LIGHT-EMITTING ELEMENT

Simplified Explanation

The deposition mask described in the abstract includes pixel openings and protrusions with a different material at the outermost peripheral portion. Additionally, crosspieces between adjacent pixel openings also include the different material.

  • Pixel openings and protrusions with different materials are formed in a deposition mask.
  • Crosspieces between adjacent pixel openings also include the different material.

Potential Applications

This technology could be used in various industries such as semiconductor manufacturing, display technology, and microelectronics.

Problems Solved

This innovation helps in achieving precise deposition patterns on substrates by controlling the material composition in specific regions of the deposition mask.

Benefits

- Enhanced control over deposition patterns - Improved accuracy in manufacturing processes - Potential for increased efficiency in production

Potential Commercial Applications

"Advanced Deposition Mask Technology for Semiconductor Manufacturing"

Possible Prior Art

There may be prior art related to deposition masks with varying material compositions in specific regions, but further research is needed to identify specific examples.

Unanswered Questions

How does the different material composition affect the overall performance of the deposition mask?

The abstract does not provide details on the impact of the different material composition on the functionality of the deposition mask.

Are there any limitations to the use of this technology in specific applications?

It is unclear from the abstract whether there are any restrictions or limitations to the application of this technology in certain industries or processes.


Original Abstract Submitted

there is provided a deposition mask in which a plurality of pixel openings are disposed in a surface, of a deposition mask, which is to face a substrate on which a deposition pattern is deposited. protrusions including a material different from a material included in the deposition mask are formed in a region which is located from a pixel opening that is disposed at an outermost peripheral portion in the surface, from among the plurality of pixel openings, up to an edge of the deposition mask. in the deposition mask, a crosspiece which is located between two pixel openings adjacent to each other, from among the plurality of pixel openings include the material.