Canon kabushiki kaisha (20240126165). IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD simplified abstract
Contents
- 1 IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD
Organization Name
Inventor(s)
Kenichi Kobayashi of Utsunomiya-shi (JP)
Tatsuya Arakawa of Saitama-shi (JP)
IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240126165 titled 'IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD
Simplified Explanation
The abstract describes an imprint apparatus that modulates incident light to cure imprint material between a substrate and a mold.
- The imprint apparatus includes a modulator to modulate incident light.
- A first optical system guides light from a first source to the modulator.
- A second optical system guides modulated light to the substrate.
Potential Applications
This technology could be used in the manufacturing of microelectronics, optical devices, and nanotechnology.
Problems Solved
This technology solves the problem of efficiently curing imprint material between a substrate and a mold.
Benefits
The benefits of this technology include improved precision, faster processing times, and enhanced quality of imprinted materials.
Potential Commercial Applications
One potential commercial application of this technology could be in the production of high-resolution displays for electronic devices.
Possible Prior Art
Prior art in this field may include similar imprint apparatuses used in the semiconductor industry for nanoimprint lithography.
Unanswered Questions
How does the modulator precisely control the curing process of the imprint material?
The abstract does not provide specific details on how the modulator modulates the incident light to cure the imprint material.
What are the specific wavelengths of the first and second light sources mentioned in the abstract?
The abstract mentions different wavelengths for the first and second light sources, but does not specify what these wavelengths are.
Original Abstract Submitted
an imprint apparatus executes imprint processing of curing imprint material in a state in which the imprint material supplied onto a substrate and a mold are in contact with each other. the imprint apparatus includes a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator, and a second optical system configured to guide modulated light modulated by the modulator to the substrate.
