Canon kabushiki kaisha (20240091825). CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE simplified abstract
Contents
- 1 CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.9.1 Unanswered Questions
- 1.9.2 How does the cleaning apparatus compare to traditional cleaning methods for original plates in terms of efficiency and effectiveness?
- 1.9.3 What are the potential maintenance requirements for the cleaning apparatus, and how does it impact the overall operational costs for users?
- 1.10 Original Abstract Submitted
CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE
Organization Name
Inventor(s)
HIROYUKI Maruyama of Tochigi (JP)
Tadayasu Nishikawa of Tochigi (JP)
CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240091825 titled 'CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE
Simplified Explanation
The patent application describes a cleaning apparatus designed to clean an original plate used in forming patterns on a substrate. The apparatus includes an irradiating unit that releases plasma onto one side of the original plate and a heating unit that radiates heat onto the other side of the plate to clean it effectively.
- The cleaning apparatus is configured to clean an original plate used in forming patterns on a substrate.
- The apparatus includes an irradiating unit that releases plasma onto one side of the original plate.
- A heating unit radiates heat onto the other side of the original plate to effectively clean it.
- The original plate is interposed between the irradiating unit and the heating unit for thorough cleaning.
Potential Applications
The technology can be used in semiconductor manufacturing, nanotechnology, and other industries where precise pattern formation is crucial.
Problems Solved
The cleaning apparatus solves the problem of efficiently cleaning original plates used in forming patterns, ensuring the quality and accuracy of the patterns produced.
Benefits
The cleaning apparatus improves the longevity and performance of original plates, leading to cost savings and enhanced productivity in manufacturing processes.
Potential Commercial Applications
The technology can be applied in the production of microchips, optical devices, and other high-precision components, offering a competitive advantage to companies in these sectors.
Possible Prior Art
Prior art may include similar cleaning apparatuses used in semiconductor manufacturing or nanofabrication processes.
Unanswered Questions
How does the cleaning apparatus compare to traditional cleaning methods for original plates in terms of efficiency and effectiveness?
The article does not provide a direct comparison between the cleaning apparatus and traditional cleaning methods, leaving uncertainty about the relative advantages of this innovative technology.
What are the potential maintenance requirements for the cleaning apparatus, and how does it impact the overall operational costs for users?
The article does not address the maintenance needs of the cleaning apparatus or its impact on operational costs, leaving a gap in understanding the long-term implications of adopting this technology.
Original Abstract Submitted
[problem] the provision of a cleaning apparatus that is useful in the cleaning of an original plate that is used when forming a pattern on top of a substrate. [means for solving the problem] a cleaning apparatus configured to clean an original plate that is used when forming a pattern in an imprint material on top of a substrate; wherein the cleaning apparatus comprises an irradiating unit configured to release plasma onto a first side of the original plate; and a heating unit configured to radiate heat onto a second side of the original plate, and heat the original plate; and wherein the irradiating unit and the heating unit are disposed such that the original plate is interposed between the irradiating unit and the heating unit.
