20240085602.SYSTEM AND METHOD FOR FABRICATING POLARIZATION HOLOGRAMS simplified abstract (meta platforms technologies, llc)

SYSTEM AND METHOD FOR FABRICATING POLARIZATION HOLOGRAMS

Organization Name

meta platforms technologies, llc

Inventor(s)

Xiayu Feng of Kirkland WA (US)

Sawyer Miller of Bellevue WA (US)

Mengfei Wang of Woodinville WA (US)

Stephen Choi of Seattle WA (US)

Lu Lu of Kirkland WA (US)

Barry David Silverstein of Kirkland WA (US)

SYSTEM AND METHOD FOR FABRICATING POLARIZATION HOLOGRAMS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240085602 titled 'SYSTEM AND METHOD FOR FABRICATING POLARIZATION HOLOGRAMS

Simplified Explanation

The system described in the patent application is designed to generate a polarization interference pattern using a light source, a transmissive polarization volume hologram (PVH) mask, and a light deflecting element. The system deflects a first beam towards the PVH mask, which then diffracts the beam into two beams with orthogonal circular polarizations that interfere with each other to create the desired pattern.

• Light source outputs a first beam with a predetermined wavelength
• Transmissive PVH mask provides diffraction efficiency to a second beam with circular polarization and non-zero incident angle
• Light deflecting element deflects the first beam towards the PVH mask
• PVH mask diffracts the second beam into two beams with orthogonal circular polarizations
• The two beams interfere to generate the polarization interference pattern

Potential Applications

This technology could be applied in:

• Optical encryption
• Holographic displays
• Optical data storage

Problems Solved

This technology solves the problem of generating complex polarization interference patterns efficiently and accurately.

Benefits

The benefits of this technology include:

• High precision in generating polarization interference patterns
• Versatility in applications such as encryption and displays
• Efficient use of light sources

Potential Commercial Applications

"Advanced Polarization Interference Pattern Generation Technology for Optical Encryption and Holographic Displays"

Possible Prior Art

One possible prior art for this technology could be the use of traditional holographic techniques for generating interference patterns.

How does this technology compare to existing methods for generating polarization interference patterns?

This article does not provide a direct comparison to existing methods for generating polarization interference patterns.

What are the limitations of this technology in terms of scalability and practical implementation?

This article does not address the limitations of this technology in terms of scalability and practical implementation.

Original Abstract Submitted

a system is provided for generating a polarization interference pattern. the system includes a light source configured to output a first beam having a predetermined wavelength. the system includes a transmissive polarization volume hologram (“pvh”) mask configured to provide a predetermined diffraction efficiency to a second beam having the predetermined wavelength, a circular polarization, and a non-zero incident angle at the transmissive pvh mask. the system includes a light deflecting element disposed between the light source and the transmissive pvh mask, and configured to deflect the first beam as the second beam toward the transmissive pvh mask. the transmissive pvh mask is configured to forwardly diffract the second beam incident thereon as a third beam and a fourth beam having orthogonal circular polarizations, a substantially same light intensity, and symmetric propagation directions. the third beam and the fourth beam interfere with one another to generate the polarization interference pattern.