18522942. PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
Contents
- 1 PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Hsin-Chang Lee of Hsinchu (TW)
Chih-Cheng Lin of Hsinchu (TW)
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK - A simplified explanation of the abstract
This abstract first appeared for US patent application 18522942 titled 'PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
Simplified Explanation
The abstract describes a method of making a semiconductor device involving forming fiducial marks on a photomask and defining a pattern with various sub-patterns on the photomask.
- Fiducial marks are created on a photomask to aid in the alignment and registration of different layers during the semiconductor device manufacturing process.
- The pattern on the photomask consists of multiple sub-patterns with different spacings between them, allowing for the creation of intricate designs on the semiconductor device.
Potential Applications
The technology described in this patent application could be applied in the manufacturing of various semiconductor devices such as integrated circuits, microprocessors, and memory chips.
Problems Solved
This technology helps to improve the accuracy and precision of patterning processes in semiconductor device manufacturing, leading to higher quality and more reliable electronic components.
Benefits
- Enhanced alignment and registration of different layers in semiconductor device fabrication. - Increased efficiency and accuracy in creating complex patterns on semiconductor devices. - Improved overall performance and reliability of semiconductor products.
Potential Commercial Applications
The technology could be utilized by semiconductor companies, electronics manufacturers, and research institutions involved in developing advanced semiconductor devices for various applications.
Possible Prior Art
One possible prior art could be the use of fiducial marks and complex patterning techniques in the semiconductor industry to improve manufacturing processes and device performance.
What are the specific materials used in creating the fiducial marks on the photomask?
The specific materials used in creating the fiducial marks on the photomask are not mentioned in the abstract. Further details on the materials and processes involved in this step would provide a more comprehensive understanding of the method.
How does the method of defining the pattern on the photomask contribute to the overall efficiency of the semiconductor device manufacturing process?
The abstract mentions defining a pattern with different spacings between sub-patterns on the photomask. Exploring how these specific spacings are determined and how they impact the final semiconductor device's performance and functionality would shed light on the significance of this aspect of the method.
Original Abstract Submitted
A method of making a semiconductor device includes forming at least one fiducial mark on a photomask. The method further includes defining a pattern including a plurality of sub-patterns on the photomask in a pattern region. The defining the pattern includes defining a first sub-pattern of the plurality of sub-patterns having a first spacing from a second sub-pattern of the plurality of sub-patterns, wherein the first spacing is different from a second spacing between the second sub-pattern and a third sub-pattern of the plurality of sub-patterns.
