18522906. ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
Contents
- 1 ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Chih-Liang Chen of Hsinchu (TW)
Shang-Hsuan Chiu of Hsinchu (TW)
ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18522906 titled 'ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR
Simplified Explanation
The integrated circuit described in the patent application involves the positioning of conductor segments in relation to active-region structures with a specific separation distance between them.
- The first conductor segment intersects a first active-region structure at a source/drain region, while the second conductor segment intersects a second active-region structure at a source/drain region.
- The first and second conductor segments are separated at their proximal edges by a separation distance.
- The distance from a first horizontal cell boundary to the proximal edge of the first conductor segment is greater than the distance from a second horizontal cell boundary to the proximal edge of the second conductor segment by a predetermined fraction of the separation distance.
Potential Applications
This technology could be applied in the development of more efficient and compact integrated circuits for various electronic devices.
Problems Solved
This innovation helps in optimizing the layout and design of integrated circuits, ensuring proper functionality and performance.
Benefits
The integrated circuit design described in the patent application allows for improved signal transmission and reduced interference between conductor segments.
Potential Commercial Applications
This technology could be utilized in the production of advanced semiconductor devices for industries such as telecommunications, computing, and consumer electronics.
Possible Prior Art
One possible prior art for this technology could be the use of similar conductor segment positioning techniques in the design of integrated circuits.
Unanswered Questions
How does this technology impact the power consumption of the integrated circuit?
The article does not provide information on how this technology affects the power efficiency of the integrated circuit.
What are the potential limitations of implementing this technology in mass production?
The article does not address any challenges or limitations that may arise when scaling up the production of integrated circuits using this technology.
Original Abstract Submitted
An integrated circuit includes a first conductor segment intersecting a first active-region structure at a source/drain region and a second conductor segment intersecting a second active-region structure at a source/drain region. The first conductor segment and the second conductor segment are separated at proximal edges by a separation distance. A distance from a first horizontal cell boundary to a proximal edge of the first conductor segment is larger than a distance from a second horizontal cell boundary to a proximal edge of the second conductor segment by a predetermined distance that is a fraction of the separation distance.
