18517387. SEMICONDUCTOR PROCESSING TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
Contents
SEMICONDUCTOR PROCESSING TOOL
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Yung-Tsun Liu of Taipei City (TW)
Kuang-Wei Cheng of Hsinchu City (TW)
Sheng-chun Yang of Tainan City (TW)
Chih-Tsung Lee of Hsinchu City (TW)
Chyi-Tsong Ni of Hsinchu City (TW)
SEMICONDUCTOR PROCESSING TOOL - A simplified explanation of the abstract
This abstract first appeared for US patent application 18517387 titled 'SEMICONDUCTOR PROCESSING TOOL
Simplified Explanation
The chuck vacuum line of a semiconductor processing tool improves efficiency by optimizing the flow of gases through the system.
- The chuck vacuum line penetrates the sidewall of the main pumping line.
- The second portion of the chuck vacuum line runs parallel to the sidewall and the direction of flow in the main pumping line.
- The size of the second portion increases from the inlet end to the outlet end along the direction of flow in the main pumping line.
Potential Applications
- Semiconductor manufacturing
- Vacuum systems
- Industrial processing equipment
Problems Solved
- Improves gas flow efficiency
- Enhances vacuum system performance
- Reduces energy consumption
Benefits
- Increased productivity
- Enhanced system reliability
- Improved overall efficiency
Original Abstract Submitted
A chuck vacuum line of a semiconductor processing tool includes a first portion that penetrates a sidewall of a main pumping line of the semiconductor processing tool. The chuck vacuum line includes a second portion that is substantially parallel to the sidewall of the main pumping line and to a direction of flow in the main pumping line. A size of the second portion increases between an inlet end of the second portion and an outlet end of the second portion along the direction of flow in the main pumping line.
