18456828. FILM FORMING APPARATUS FOR FORMING METAL FILM simplified abstract (TOYOTA JIDOSHA KABUSHIKI KAISHA)

FILM FORMING APPARATUS FOR FORMING METAL FILM

Organization Name

TOYOTA JIDOSHA KABUSHIKI KAISHA

Inventor(s)

Haruki Kondoh of Okazaki-shi (JP)

Keiji Kuroda of Toyota-shi (JP)

Koji Inagaki of Toyota-shi (JP)

FILM FORMING APPARATUS FOR FORMING METAL FILM - A simplified explanation of the abstract

This abstract first appeared for US patent application 18456828 titled 'FILM FORMING APPARATUS FOR FORMING METAL FILM

Simplified Explanation

The film forming apparatus described in the patent application includes a pressing mechanism that applies fluid pressure from a plating solution to the mask structure, which consists of a screen mask with a predetermined pattern and a frame supporting the mask on the substrate side. The frame has an inner covering portion made of a softer elastic material along the opening edge that contacts the electrolyte membrane.

• Pressing mechanism applies fluid pressure to mask structure
• Mask structure consists of screen mask and frame with inner covering portion
• Inner covering portion made of softer elastic material

Potential Applications

The technology described in the patent application could be applied in the manufacturing of electronic devices, such as displays, sensors, and circuit boards, where precise and uniform film formation is required.

Problems Solved

This technology solves the problem of achieving uniform film formation on substrates by providing a mask structure with an inner covering portion that ensures proper contact with the electrolyte membrane during the plating process.

Benefits

The benefits of this technology include improved efficiency in film formation, increased accuracy in pattern replication, and reduced material waste during the plating process.

Potential Commercial Applications

One potential commercial application of this technology is in the production of high-resolution displays for electronic devices, where precise patterning and uniform film thickness are essential for optimal performance.

Possible Prior Art

One possible prior art for this technology could be similar film forming apparatus used in the semiconductor industry for photolithography processes.

How does the inner covering portion affect the film formation process?

The inner covering portion made of a softer elastic material in the frame is designed to ensure proper contact with the electrolyte membrane during the plating process. This helps to maintain uniform pressure and improve the accuracy of pattern replication on the substrate.

What materials are commonly used for the inner covering portion in similar technologies?

The inner covering portion is typically made of an elastic material softer than the frame material, such as silicone or rubber, to provide flexibility and ensure proper contact with the electrolyte membrane.

Original Abstract Submitted

The film forming apparatus includes a pressing mechanism that presses the mask structure by the electrolyte membrane with a fluid pressure of a plating solution. The mask structure includes a screen mask in which a penetrating portion corresponding to a predetermined pattern is formed, and a frame that supports a peripheral edge of the screen mask on a side adjacent to the substrate. In the frame, an inner covering portion made of an elastic material softer than a material of the frame is formed along an opening edge contacting the electrolyte membrane.