18447187. REDUCED AREA STANDARD CELL ABUTMENT CONFIGURATIONS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
REDUCED AREA STANDARD CELL ABUTMENT CONFIGURATIONS
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Hui-Zhong Zhuang of Hsinchu (TW)
REDUCED AREA STANDARD CELL ABUTMENT CONFIGURATIONS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18447187 titled 'REDUCED AREA STANDARD CELL ABUTMENT CONFIGURATIONS
Simplified Explanation
The patent application describes a method for designing a semiconductor device by analyzing the vertical abutment between two cell blocks and selecting a modified cell block to reduce any mismatch and spacing between them. The modified cell block has a continuous active region along an edge of the vertical abutment. The first standard cell block is replaced with the modified cell block to obtain a modified layout design.
- The method analyzes the vertical abutment between two cell blocks.
- If a mismatch is identified, a modified cell block is selected.
- The modified cell block reduces the mismatch and spacing between the two cell blocks.
- The modified cell block has a continuous active region along the edge of the vertical abutment.
- The first standard cell block is replaced with the modified cell block to obtain a modified layout design.
Potential Applications
This technology can be applied in the design and manufacturing of semiconductor devices, such as integrated circuits and microchips.
Problems Solved
1. Mismatch between standard cell blocks and cell blocks can cause issues in the design and manufacturing process of semiconductor devices. 2. Spacing between cell blocks can lead to inefficiencies and limitations in the overall design.
Benefits
1. The method reduces mismatches and spacing between cell blocks, improving the overall design and performance of semiconductor devices. 2. The continuous active region along the edge of the vertical abutment ensures better integration and connectivity between cell blocks. 3. The modified layout design obtained through this method can lead to more efficient and optimized semiconductor devices.
Original Abstract Submitted
A method of designing a semiconductor device including the operations of analyzing a vertical abutment between a first standard cell block and a second cell block and, if a mismatch is identified between the first standard cell block and the second cell block initiating the selection of a first modified cell block that reduces the mismatch and a spacing between the first modified cell block and the second cell block, the first modified cell block comprising a first abutment region having a continuous active region arranged along a first axis parallel to an edge of the vertical abutment, and replacing the first standard cell block with the first modified cell block to obtain a first modified layout design and devices manufactured according to the method.
