18379731. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 SEMICONDUCTOR DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Byeol Hae Eom of Suwon-si (KR)
Byung Ha Choi of Suwon-si (KR)
Won Cheol Jeong of Suwon-si (KR)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18379731 titled 'SEMICONDUCTOR DEVICE
Simplified Explanation
The semiconductor device described in the abstract includes multiple element separation structures, active patterns, gate electrodes, and more. Here is a simplified explanation of the patent application:
- The semiconductor device consists of three element separation structures arranged in a specific order.
- Active patterns are present between the element separation structures, with different widths in the second direction.
- Gate electrodes extend in the second direction on the active patterns.
Potential Applications
This technology could be applied in the development of advanced semiconductor devices for various electronic applications.
Problems Solved
This innovation helps in enhancing the performance and efficiency of semiconductor devices by optimizing the layout and structure of active patterns and gate electrodes.
Benefits
The benefits of this technology include improved functionality, increased speed, and reduced power consumption in semiconductor devices.
Potential Commercial Applications
"Optimized Layout for Semiconductor Devices: Enhancing Performance and Efficiency"
Possible Prior Art
There may be prior art related to the optimization of active patterns and gate electrodes in semiconductor devices, but specific examples are not provided in this context.
Unanswered Questions
How does this technology compare to existing semiconductor device layouts in terms of performance and efficiency?
This article does not provide a direct comparison with existing layouts to assess the advantages of the proposed design.
Are there any specific industries or applications where this technology would be most beneficial?
The potential targeted industries or applications for this technology are not explicitly mentioned in the article.
Original Abstract Submitted
A semiconductor device includes a first element separation structure, a second element separation structure, and a third element separation structure sequentially disposed along a first direction and extending in a second direction intersecting the first direction; a first active pattern extending in the first direction between the first element separation structure and the second element separation structure; a second active pattern extending in the first direction between the second element separation structure and the third element separation structure and separated from the first active pattern by the second element separation structure; a first gate electrode extending in the second direction on the first active pattern; and a plurality of second gate electrodes extending in the second direction on the second active pattern, wherein a width of the first active pattern in the second direction is greater than a width of the second active pattern in the second direction.
