18360391. TONER AND METHOD FOR PRODUCING TONER simplified abstract (CANON KABUSHIKI KAISHA)
Contents
TONER AND METHOD FOR PRODUCING TONER
Organization Name
Inventor(s)
KENTA Kamikura of Kanagawa (JP)
SATOSHI Arimura of Shizuoka (JP)
TONER AND METHOD FOR PRODUCING TONER - A simplified explanation of the abstract
This abstract first appeared for US patent application 18360391 titled 'TONER AND METHOD FOR PRODUCING TONER
Simplified Explanation
The abstract describes a toner comprising a toner particle with resin A (a vinyl resin with a sulfonic acid-type group) and resin B (a polyester resin). The analysis of the toner particle using time-of-flight secondary ion mass spectrometry reveals specific relationships between the abundance of resin A and resin B at different depths from the toner particle surface.
- Toner composition includes resin A (vinyl resin with sulfonic acid-type group) and resin B (polyester resin).
- Analysis using time-of-flight secondary ion mass spectrometry reveals specific relationships between resin A and resin B abundance at different depths from toner particle surface.
- Potential Applications
- Printing industry for high-quality prints - Manufacturing of toner cartridges for printers
- Problems Solved
- Ensures proper composition of toner particles for optimal printing performance - Helps in quality control during toner production
- Benefits
- Improved print quality - Consistent performance of toner cartridges - Enhanced durability of printed materials
Original Abstract Submitted
A toner comprising a toner particle comprising a resin A and a resin B; wherein: the resin A is a vinyl resin having a sulfonic acid-type group, the resin B is a polyester resin; and when in analysis of the toner particle using time-of-flight secondary ion mass spectrometry, DA (nm) is defined as a depth at which an abundance of the resin A in a depth of 10 nm from a toner particle surface is a maximum, CA(%) is defined as an abundance of the resin A at the depth DA, CB(%) is defined as an abundance of the resin B at the depth DA, CA(%) is defined as an abundance of the resin A at a depth of 75 nm and CB(%) is defined as an abundance of the resin B at a depth of 75 nm, CA, CA, CBand CBsatisfy specific relationships.
