18351637. IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
TOMOHIRO Harayama of Tochigi (JP)
IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18351637 titled 'IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
An imprint apparatus is described in this patent application, which is used for forming a pattern of an imprint material on a substrate using a mold. The apparatus includes a control unit that is responsible for controlling the inspection process of the imprint process.
The imprint process involves an arrangement process, where a stage is driven between a first position below the mold and a second position below a dispenser. During this arrangement process, multiple states are obtained, each of which involves sub-pixel shifting of a shot region with respect to an imaging surface, based on the stage driving.
The control unit obtains multiple first sub-pixel shift images corresponding to the obtained states and inspects the imprint process based on these images.
- The patent application describes an imprint apparatus for forming patterns on a substrate using a mold.
- The apparatus includes a control unit that controls the inspection process of the imprint process.
- The imprint process involves an arrangement process where a stage is driven between positions below the mold and a dispenser.
- Multiple states are obtained during the arrangement process, each involving sub-pixel shifting of a shot region with respect to an imaging surface.
- The control unit obtains multiple first sub-pixel shift images corresponding to the obtained states.
- The control unit inspects the imprint process based on these images.
Potential applications of this technology:
- Semiconductor manufacturing: This imprint apparatus can be used in the production of semiconductor devices, where precise patterns need to be formed on substrates.
- Nanotechnology: The apparatus can be applied in nanotechnology research and development, where precise patterning is required at a small scale.
- Optics and photonics: The technology can be used in the fabrication of optical components and devices, where precise patterns are crucial for performance.
Problems solved by this technology:
- Precise pattern formation: The imprint apparatus allows for sub-pixel shifting of shot regions, enabling the formation of highly accurate patterns on substrates.
- Inspection process control: The control unit of the apparatus ensures that the imprint process is inspected effectively, leading to improved quality control and defect detection.
Benefits of this technology:
- Improved pattern accuracy: The sub-pixel shifting capability of the apparatus enhances the accuracy of pattern formation, resulting in higher quality products.
- Enhanced inspection process: The control unit's ability to obtain and analyze multiple sub-pixel shift images improves the inspection process, leading to better defect detection and process optimization.
Original Abstract Submitted
An imprint apparatus for performing an imprint process of forming a pattern of an imprint material on a substrate using a mold, including a control unit configured to control a process concerning inspection of the imprint process, wherein the imprint process includes an arrangement process including stage driving of driving a stage between a first position below the mold and a second position below a dispenser, and in a case where a plurality of states are obtained, in each of which a shot region is sub-pixel shifted with respect to an imaging surface in accordance with the stage driving during the arrangement process, the control unit obtains a plurality of first sub-pixel shift images corresponding to the plurality of states, and inspects the imprint process based on the plurality of first sub-pixel shift images.
