View source for 18348469. METHOD AND SYSTEM FOR MEASURING STRUCTURE BASED ON SPECTRUM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=METHOD AND SYSTEM FOR MEASURING STRUCTURE BASED ON SPECTRUM=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:QHwan Kim of Suwon-si (KR)|QHwan Kim of Suwon-si (KR)]][[Category:QHwan Kim of Suwon-si (KR)]]

[[:Category:Jaeyoon Kim of Suwon-si (KR)|Jaeyoon Kim of Suwon-si (KR)]][[Category:Jaeyoon Kim of Suwon-si (KR)]]

[[:Category:Hyeonkyun Noh of Suwon-si (KR)|Hyeonkyun Noh of Suwon-si (KR)]][[Category:Hyeonkyun Noh of Suwon-si (KR)]]

[[:Category:Ami Ma of Suwon-si (KR)|Ami Ma of Suwon-si (KR)]][[Category:Ami Ma of Suwon-si (KR)]]

[[:Category:Sunghee Lee of Suwon-si (KR)|Sunghee Lee of Suwon-si (KR)]][[Category:Sunghee Lee of Suwon-si (KR)]]

[[:Category:Kyubaik Chang of Suwon-si (KR)|Kyubaik Chang of Suwon-si (KR)]][[Category:Kyubaik Chang of Suwon-si (KR)]]

[[:Category:Wooyoung Cheon of Suwon-si (KR)|Wooyoung Cheon of Suwon-si (KR)]][[Category:Wooyoung Cheon of Suwon-si (KR)]]

[[:Category:Jaehoon Jeong of Suwon-si (KR)|Jaehoon Jeong of Suwon-si (KR)]][[Category:Jaehoon Jeong of Suwon-si (KR)]]

==METHOD AND SYSTEM FOR MEASURING STRUCTURE BASED ON SPECTRUM - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18348469 titled 'METHOD AND SYSTEM FOR MEASURING STRUCTURE BASED ON SPECTRUM

==Simplified Explanation==

The abstract of this patent application describes a method for measuring a structure based on a spectrum. The method involves obtaining a first model that includes two sub-models, training the first sub-model based on simulation data, generating a second model with a third sub-model identical to the first sub-model, training the second model based on sample spectrum data obtained from measuring spectra of sample structures, and estimating the structure from measured spectrum data obtained by measuring a spectrum of the structure using the trained second model.

* The method involves using a first model trained on simulation data and a second model trained on sample spectrum data to estimate the structure based on measured spectrum data.
* The first model includes two sub-models, with the second sub-model following the first sub-model.
* The second model includes a third sub-model identical to the first sub-model.
* The first sub-model is trained based on simulation data, while the second model is trained based on sample spectrum data obtained from measuring spectra of sample structures.
* The estimated structure is obtained by applying the trained second model to the measured spectrum data obtained from measuring a spectrum of the structure.

Potential applications of this technology:

* This method can be used in various fields where the measurement and analysis of structures based on spectra are required, such as material science, chemistry, and biology.
* It can be applied in quality control processes to ensure the accuracy and consistency of measured spectra and the corresponding structure estimation.
* This technology can be used in research and development to study the properties and characteristics of different structures based on their spectra.

Problems solved by this technology:

* This method provides a more accurate and reliable way to measure and estimate the structure of a sample based on its spectrum.
* It eliminates the need for extensive and time-consuming manual analysis of spectra and structures.
* The use of simulation data and sample spectrum data improves the training and estimation process, leading to better results.

Benefits of this technology:

* The method allows for faster and more efficient measurement and estimation of structures based on spectra.
* It reduces the potential for human error in the analysis and estimation process.
* The use of simulation data and sample spectrum data improves the accuracy and reliability of the structure estimation.
* This technology can contribute to advancements in various scientific and industrial fields by providing a more effective tool for structure analysis.


==Original Abstract Submitted==

A method for measuring a structure based on a spectrum, includes obtaining a first model that includes a first sub-model and a second sub-model following the first sub-model and is trained based on simulation data, generating a second model including a third sub-model identical to the first sub-model, training the second model based on sample spectrum data generated by measuring spectra of sample structures, and estimating, based on the trained second model, the structure from measured spectrum data generated by measuring a spectrum of the structure.



[[Category:G06F30/398]]