18343231. DISPLAY DEVICE AND METHOD OF MANUFACTRING THE SAME simplified abstract (SAMSUNG DISPLAY CO., LTD.)
Contents
DISPLAY DEVICE AND METHOD OF MANUFACTRING THE SAME
Organization Name
Inventor(s)
Kyoung Won Lee of Yongin-si (KR)
Yeon Hong Kim of Yongin-si (KR)
Eun Hyun Kim of Yongin-si (KR)
DISPLAY DEVICE AND METHOD OF MANUFACTRING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18343231 titled 'DISPLAY DEVICE AND METHOD OF MANUFACTRING THE SAME
Simplified Explanation
The abstract describes a display device that includes various layers and regions, such as a light blocking layer, buffer layer, semiconductor layer, gate insulating layer, gate electrode, interlayer insulating layer, and a dummy gate electrode.
- The light blocking layer is positioned on a substrate and has a first portion and a second portion with a greater thickness.
- Above the light blocking layer is the buffer layer.
- The semiconductor layer is positioned over the buffer layer and includes a source region, a channel region, and a drain region.
- The gate insulating layer is positioned over the semiconductor layer.
- The gate electrode is positioned over the gate insulating layer.
- The interlayer insulating layer is positioned over the gate electrode and includes a first opening overlapping the second portion of the light blocking layer and a second opening overlapping the source region of the semiconductor layer.
- The dummy gate electrode is positioned on a side surface of the first opening.
Potential applications of this technology:
- Display devices: The described structure can be used in various types of display devices, such as LCDs, OLEDs, or microLEDs, to improve their performance and functionality.
- Semiconductor devices: The semiconductor layer and its regions can be utilized in other semiconductor devices, such as transistors or integrated circuits, to enhance their performance.
Problems solved by this technology:
- Light blocking: The light blocking layer helps to prevent unwanted light from affecting the display quality, improving contrast and image clarity.
- Gate insulation: The gate insulating layer provides insulation between the gate electrode and the semiconductor layer, preventing leakage and ensuring proper device operation.
- Interlayer insulation: The interlayer insulating layer helps to isolate different layers and regions, reducing interference and improving device reliability.
Benefits of this technology:
- Enhanced display performance: The described structure helps to improve the overall performance of display devices, including image quality, contrast ratio, and response time.
- Increased device reliability: The use of various insulating layers and proper isolation techniques enhances the reliability and lifespan of the display device.
- Compatibility with different semiconductor devices: The semiconductor layer and its regions can be adapted for use in various semiconductor devices, providing versatility and compatibility with different applications.
Original Abstract Submitted
A display device includes a light blocking layer positioned on a substrate and including a first portion and a second portion having a thickness greater than a thickness of the first portion; a buffer layer positioned above the light blocking layer; a semiconductor layer positioned over the buffer layer and including a source region, a channel region, and a drain region; a gate insulating layer positioned over the semiconductor layer; a gate electrode positioned over the gate insulating layer; an interlayer insulating layer positioned over the gate electrode, and including a first opening overlapping the second portion of the light blocking layer in a plan view and a second opening overlapping the source region of the semiconductor layer in a plan view; and a dummy gate electrode positioned on a side surface of the first opening.
